Etch

»HOW TO BUY ETCH

HOW TO BUY ETCH »how to buy any of our films

DVD

Etch

  • $25




Etch in 7-DVD set

Includes: Silicon Run I, Silicon Run II, Silicon Run Lite, Deposition, Lithography, Etch and Implantation.

  • $125




Etch in 9-DVD set

Includes: Nanotechnology, MEMS, Silicon Run I, Silicon Run II, Silicon Run Lite, Deposition, Lithography, Etch and Implantation.

  • $200




STREAMING

Silicon Run Productions offers two options for streaming, one for individuals and another for institutions.

Vimeo On Demand

At Vimeo, individuals can purchase a 24-hour license to stream any Silicon Run Productions film, or select a one-week license to stream the entire series.

If you are a university or college student, be sure to check if your school already has access by clicking on the check access link under Kanopy below.

»Stream from Vimeo

Kanopy

Institutional licensing for your college or university library is available through Kanopy.

If you are a professor or student at an educational institution:
If your university/college library is already a Kanopy subscriber, you have immediate streaming access!
»Check access

If you are a librarian or professor for your educational institution:
»Contact us to obtain a Kanopy streaming license for your institution.

If you are a media buyer for an institution that is not a college or university:
»Contact us to obtain a Kanopy streaming license for your institution.

This sixth film in the SILICON RUN SERIES takes a close look at the etch process in semiconductor manufacturing, including chemical mechanical polish, or CMP. It shows how thin films of nonconductive, semiconductive, and conductive materials are sculpted into microchips.

Following the fabrication process of a CMOS transistor, SILICON RUN ETCH looks specifically at dielectric etch, silicon etch, and metal etch. It also explores the role of pressure, gas flows, RF power, temperature, and machine geometry within the plasma etch processes.

37 minutes / 2000

SILICON RUN ETCH is the perfect film to demonstrate, in clear and vivid graphics, the basics of the etch process as used in most production fabs today. It takes a complicated and complex process and presents it in a straight-forward, fun formatPaul Martinez
Etch Product Specialist Applied Materials

Etch TOPIC Summary

  • IC Fabrication Overview
  • Wet Etch
  • Dry Etch
  • Planarization (CMP)
  • Selectivity
  • Plasma
  • Plasma Variables
  • Vacuum
  • Chemical Reactions
  • Physical Reactions
  • Sidewall Deposition
  • Defect Inspection
  • End Point Detection
  • Wafer Thinning

Partial Funding from the Intel Foundation, Texas Instruments, Maricopa Advanced Technology Education Center, Applied Materials, Tru-Si Technologies, and SEMI.