SILICON RUN’s film DEPOSITION uses 3D atomic animation and live manufacturing footage to provide a detailed close-up look at the process of thin film deposition in CMOS fabrication. It shows the chemical and physical reactions that create the dielectric and conductive layers of an integrated circuit.

SILICON RUN DEPOSITION examines the selection of raw materials according to the process and equipment to be used and the material’s ability to produce quality films with the desired properties. Also featured is the intricate role that temperature, time, pressure, and reactant concentrations all play at the atomic level.

31 minutes / 1998

Silicon Run Deposition is especially popular with the students. We will use it to augment some of our undergraduate classes as well as some graduate seminars. It will also be included in our regularly scheduled viewing of the other Silicon Run videos, and I’ll keep a copy in my office for students to browse and for other professors to use.Stefan Myhajlenko
Center for Solid States Electronics
Arizona State University

Gives the students a good perspective on how micromachining technologies are used to make integrated circuits, which is important since the technologies are the basis for producing MEMS.Jack Judy, Electrical Engineering
University of California, Los Angeles


Deposition TOPIC Summary

  • CMOS Technology
  • Spin-On Deposition
  • Atomic Reactions
  • Film Properties
  • Thin Film Applications
  • Planarization
  • Gaseous, Solid, & Liquid Raw Materials
  • Thin Film Electrical Properties
  • Growth Process (Oxidation)
  • Multilevel Metalization
  • Physical Vapor Deposition (Sputtering)
  • Chemical Vapor Deposition (APCDV, LPCVD, PECVD)

Partially funded by the Intel Foundation, Applied Materials, Nikon, Air Products and Chemicals, and SEMI.